Material for sion-optical waveguides and method for...

C - Chemistry – Metallurgy – 03 – C

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C03C 3/04 (2006.01) C01B 21/082 (2006.01) C01B 21/087 (2006.01) C03B 19/14 (2006.01) C03C 1/02 (2006.01) C03C 3/11 (2006.01) C23C 16/30 (2006.01) G02B 6/10 (2006.01) G02B 6/122 (2006.01) G02B 6/13 (2006.01) G02B 6/132 (2006.01) G02B 6/12 (2006.01)

Patent

CA 2397845

A new material is provided that can be used for the fabrication of planar optical waveguides. The material includes silicon, oxygen and nitrogen and additionally deuterium. Also provided is a method for fabricating planar optical waveguides based on this new material, which uses deuterated gaseous precursors.

L'invention se rapporte à une nouvelle matière pouvant être utilisée pour la fabrication de guides d'ondes optiques plans. Cette matière contient du silicium, de l'oxygène, de l'azote et également du deutérium. L'invention se rapporte également à un procédé de fabrication de guides d'ondes optiques plans à partir de cette nouvelle matière, qui utilise des précurseurs gazeux deutérés.

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