C - Chemistry – Metallurgy – 08 – F
Patent
C - Chemistry, Metallurgy
08
F
C08F 283/12 (2006.01) C08J 3/24 (2006.01) C08J 5/18 (2006.01) G03G 5/05 (2006.01) G03G 5/06 (2006.01)
Patent
CA 2566734
Siloxane-containing materials that have been prepared by a sol-gel method and polymeric binder materials form interpenetrating networks. Silicon-containing layers including such interpenetrating networks are provided. Methods for preparing interpenetrating networks and silicon-containing layers including interpenetrating networks are also provided. In addition, photoreceptors and image-forming apparatus including such silicon-containing layers are provided.
Des matériaux renfermant des siloxanes obtenus grâce à une méthode sol-gel et des matériaux liants polymériques forment des réseaux interpénétrants. Des couches renfermant du silicium comprenant de tels réseaux interpénétrants sont proposées. On fournit également des méthodes permettant de préparer des réseaux interpénétrants et des couches contenant des réseaux interpénétrants. De plus, des photorécepteurs et un appareil formant des images et comprenant de telles couches à base de silicium sont présentés.
Bender Timothy P.
Gagnon Yvan
Graham John F.
Hsiao Cheng-Kuo
Hu Nan-Xing
Sim & Mcburney
Xerox Corporation
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