C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/301, 260/308
C07D 285/08 (2006.01) C07D 417/04 (2006.01)
Patent
CA 2021447
ABSTRACT Compounds represented by the general formula(II): Image (II) in which R1 represents an organic group, and R? represents a lower alkanoylamino group. Salts of these compounds are also disclosed. These compounds are useful for the preparation of compounds of the general formula(I) Image (I) where R? represents an amino or a protected amino group and R1 is the same as above, which have an excellent antimicrobial activity. Compounds I can be prepared by hydrolyzing a compound of formula II. Compound II may be prepared by introducing an amino protecting group in position 5 of the compound of general formula(III) Image (III)
Sakane Kazuo
Terasawa Takeshi
Fujisawa Pharmaceutical Co. Ltd.
Swabey Ogilvy Renault
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