Plasma discharge ion source

H - Electricity – 01 – J

Patent

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358/9

H01J 1/32 (2006.01) H01J 27/14 (2006.01)

Patent

CA 1102931

PLASMA DISCHARGE ION SOURCE Abstract of the Disclosure The specification discloses an ion source in which a compound of the material of a desired ion is dissociated in a plasma discharge process between an anode and a cathode to provide a beam of charged particles including the desired ions. The proportion of the desired ion in the particle beam is selected by adjustment of the tem- perature of the plasma beyond that which was previously attainable in ion sources of this type. This is achieved by disposing a pair of magnetic members adjacent the ends of the anode so as to constrict the magnetic fields at the ends of the anode.

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