G - Physics – 03 – F
Patent
G - Physics
03
F
G03F 7/022 (2006.01) C07C 50/12 (2006.01) C07C 309/76 (2006.01)
Patent
CA 2422211
The invention provides a 1,2-naphthoquinone-2- diazidesulfonate ester photosensitive agent which is useful as a photosensitive agent employed in a photoresist for producing semiconductor integrated circuits, liquid crystal displays, EL displays, etc., a method for producing the photosensitive agent, and a photoresist composition containing the photosensitive agent. The 1,2-naphthoquinone- 2-diazidesulfonate ester photosensitive agent is produced by reacting a polyhydric phenol with 1,2-naphthoquinone-2- diazidesulfonyl chloride in the presence of a neutralizing agent, wherein the polyhydric phenol is obtained by a condensation reaction between resorcinol and at least one aldehyde selected from C3-C10 aldehydes, and contains, as a predominant component, a compound represented by formula (I) and components exhibiting a retention time as measured by using GPC shorter than that of the compound represented by formula (I) in an amount of 10% or less: Image wherein each of R1, R2, R3, and R4 represents a C2-C9 alkyl group.
Hagiwara Yuichi
Iida Hirotada
Katori Suehiro
Miyazaki Tsuneaki
Suwa Miharu
Ogilvy Renault Llp/s.e.n.c.r.l.,s.r.l.
Toyo Gosei Kogyo Co. Ltd.
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