C - Chemistry – Metallurgy – 07 – H
Patent
C - Chemistry, Metallurgy
07
H
C07H 17/08 (2006.01) C07H 23/00 (2006.01)
Patent
CA 2127259
Abstract A compound of the following formula is provided: Image wherein A represents a carbonyl group which may be protected; B represents an aldehyde group which may be protected; R1 represents a hydroxyl group which may be protected; R2 represents a hydrogen atom or acyl group; W represents a hydrogen atom, hydroxyl group, lower alkanoyloxy group or substituted sulfonyloxy group; Y represents a hydrogen atom, halogen atom, hydroxyl group or substituted sulfonyloxy group; and broken line "-------" represents a double bond or single bond. This compound is useful for producing 3,4'-dideoxy- mycaminosyltylonolide useful as an antimicrobial agent. 94
Kageyama Shunji
Kominato Kaichiro
Matsumoto Naoki
Miyake Toshiaki
Takeuchi Tomi
Dennison Associates
Zaidan Hojin Biseibutsu Kagaku Kenkyukai
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