C - Chemistry – Metallurgy – 07 – F
Patent
C - Chemistry, Metallurgy
07
F
C07F 7/10 (2006.01) A01N 55/00 (2006.01) C07F 7/08 (2006.01)
Patent
CA 2082574
3-Isoxazolylphenyl compounds Ia and Ib (see Formulas Ia and Ib) where R is halogen; alkyl; haloalkyl; alkoxy; haloalkoxy; alkenyl; haloalkenyl; unsubstituted or substituted phenylethenyl; alkynyl; cycloalkyl; aryl; hetaryl; CO2R5 or CONR7R8, R6 is hydrogen, alkyl, cycloalkyl or benzyl; R7 and R8 are each hydrogen, alkyl, cycloalkyl or benzyl or, together with the nitrogen atom to which they are bonded, form a heterocyclic radical; n is 0, 1 or 2; R1 is halogen or alkyl; R2 is hydrogen; alkyl; alkenyl; alkynyl or cyano; R3 and R4 independently of one another are each unsub- stituted or substituted alkyl, alkenyl, cycloalkyl, phenyl, naphthyl, pyridyl or pyrimidinyl; or R3 and R4 together form unsubstituted or substituted alkylene; R5 is hydrogen; unsubstituted or substituted alkyl or one of the groups stated fox R3; X is CH2, O, S or NR9 and R9 is hydrogen, alkyl, cycloalkyl, alkenyl, alkynyl or unsubstituted or substituted benzyl, processes for their preparation, agents containing them and the use thereof.
Harries Volker
Mueller Stefan
Rang Harald
Theobald Hans
Basf Aktiengesellschaft
Harries Volker
Mueller Stefan
Rang Harald
Robic
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