C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/206, 167/227
C07D 457/00 (2006.01) A61K 31/48 (2006.01) C07D 457/02 (2006.01) C07D 457/06 (2006.01)
Patent
CA 2031510
Abstract Compounds of formula I Image I in which R2 means optionally substituted C1-7 alkyl, C2-7 alkenyl, CH2-O-C1-4 alkyl or CH2-S-C1-4 alkyl R6 means C2-6 alkyl, C3-6 alkenyl or C3-5-cycloalkyl-C1-2 alkyl and RR means CH2-X, Image or CO-NR3-CO NH R4 in which X stands for CN, OCH3, SCH3 or CONH2 and R1 stands for hydrogen, halogen, methyl or methoxy, and R3 and R4 each mean C1-4 alkyl or (CH2)n-N(CH3)2, in which n = 1-4, and their acid addition salts, the process for their production, their use as pharmaceutical agents as well as intermediate compounds are described.
Brumby Thomas
Loschmann Peter A.
Sauer Gerhard
Turner Jonathan
Wachtel Helmut
Marks & Clerk
Schering Aktiengesellschaft
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