A cleaning wipe comprising low residue surfactant and...

Details A cleaning wipe comprising low residue surfactant and... A cleaning wipe comprising low residue surfactant and...

C - Chemistry, Metallurgy

11

D

C11D 17/04 (2006.01) C11D 1/66 (2006.01) C11D 3/37 (2006.01)

Patent

CA 2394626

The invention provides an improved cleaning wipe which requires no scrubbing, buffing, polishing or rinsing, with the following components: (a) a wipe which comprises at least one layer of absorbent/adsorbent material; (b) a liquid cleaner which comprises: (i) a low residue surfactant; (ii) a hydrophilic polymer; and (iii) the remainder, water.

Cette invention se rapporte à une serviette nettoyante améliorée qui ne nécessite pas de frottage, de tamponnage, de polissage ou de rinçage et qui contient les composants suivants: (a) une serviette constituée par au moins une couche de matière absorbante/adsorbante; (b) un nettoyant liquide qui renferme: (i) un tensioactif faiblement résiduel; (ii) un polymère hydrophile et (iii) de l'eau, pour la partie restante.

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