C - Chemistry – Metallurgy – 23 – F
Patent
C - Chemistry, Metallurgy
23
F
149/16, 134/29
C23F 1/36 (2006.01) C11D 1/60 (2006.01) C11D 3/06 (2006.01) C11D 7/06 (2006.01)
Patent
CA 2038268
ABSTRACT OF THE DISCLOSURE A cleaning and etching solution and method for aluminum surfaces is disclosed which is an alkaline formulation which includes a quaternary cationic surfactant. The preferred cleaner includes an alkali metal hydroxide, gluconic acid, a first phosphonate, a second phosphonate and a quaternary cationic surfactant.
Deck Philip D.
Rivera Jose B.
Betz Laboratories Inc.
Betzdearborn Inc.
Borden Ladner Gervais Llp
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