G - Physics – 03 – F
Patent
G - Physics
03
F
G03F 7/42 (2006.01)
Patent
CA 2106750
Addition of non-nitrogen containing weak acids to amine-containing alkaline strippers for photoresists produce stripper compositions able to strip highly cross-linked or hardened photoresist films without producing any substantial metal corrosion. Weak acids useful in the stripping compositions include those having a pK in aqueous solution of 2.0 or higher and an equivalent weight of less than about 140 and are employed in an amount to neutralize from about 19% to about 75% of the amine present in the stripper composition.
L'addition d'acides faibles non azotés à des agents de pelage de photorésine, alcalins et renfermant une amine, permet d'obtenir des compositions de pelage capables de peler des films de photorésine hautement réticulés ou durcis sans produire de corrosion appréciable du métal. Parmi les acides faibles utilisables pour ces compositions de pelage, on retrouve ceux ayant un pK en solution aqueuse de 2,0 ou plus et un poids équivalent inférieur à environ 140. Ceux-ci sont utilisés en quantités telles que d'environ 19 à environ 75 % de l'amine présente dans la composition de pelage sont neutralisés.
Avantor Performance Materials Inc.
Osler Hoskin & Harcourt Llp
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