4. B - Operations, Transporting
  5. 01
  6. D

Inc. Avantor Performance Materials

B - Operations – Transporting – 01 – D

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Country: United States Of America

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Alkaline, post plasma etch/ash residue removers and...

G - Physics – 03 – F
Patent

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Alkaline-containing photoresist stripping compositions...

G - Physics – 03 – F
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Ammonia-free alkaline microelectronic cleaning compositions...

C - Chemistry – Metallurgy – 11 – D
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Ammonia-free alkaline microelectronic cleaning compositions...

C - Chemistry – Metallurgy – 11 – D
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Aqueous acidic formulations for copper oxide etch residue...

H - Electricity – 01 – L
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