C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
C07C 311/19 (2006.01) A61K 31/195 (2006.01) A61K 31/38 (2006.01) A61K 31/44 (2006.01) C07C 229/28 (2006.01) C07C 233/47 (2006.01) C07C 275/18 (2006.01) C07D 211/34 (2006.01) C07D 211/96 (2006.01) C07D 213/56 (2006.01) C07D 333/24 (2006.01)
Patent
CA 2096293
Compounds of the formula (I) : (see Fig. I) wherein: R1 and R2, identical or different, represent a linear or branched alkyl group (C1-C6), a substituted or unsubstituted phenyl group, a pyridinyl group, a thienyl group, or form, with the carbon atom to which they are attached, a substituted or unsubstituted cycloalkyl cycle (C4-C7); R3 represents a substituted or unsubstituted phenylsulfonyl group, a linear or branched alkyl group (C1-C6), an alkylaminocarbonyl group, or a linear or branched acyl group (C1-C6); R4 represents one of the groups CH CH (CH2)p C02H or CH2 CH2 (CH2)p C02H, in which p is equal to 0, 1, 2 or 3, n and m, identical or different, represent 0, 1 or 2, their isomers, enantiomers, diastereoisomers and epimers as well as their addition salts with a pharmaceutically acceptable acid or base. Medicaments.
Composés de formule (I) : (voir fig. I) dans laquelle : R1 et R2 identiques ou différents représentent un radical alkyle (C1-C6) linéaire ou ramifié, un radical phényle substitué ou non, un radical pyridinyl, un radical thiényl, ou forment, avec l'atome de carbone auxquels ils sont attachés, un cycle cycloalkyle (C4-C7) substitué ou non, R3 représente - un radical phénylsulfonyl substitué ou non, - un radical alkyle (C1-C6) linéaire ou ramifié, - un radical alkylaminocarbonyl, - ou un radical acyle (C1-C6) linéaire ou ramifié, R4 représente l'un quelconque des radicaux : ~CH~CH~(CH2)p~ C0 2H ou ~CH2~CH2~(CH2)p~C0 2H dans lesquels p est égal à 0, 1, 2 ou 3, n et m identiques ou différents représentent 0, 1 ou 2, leurs isomères, énantiomères, diastéréoisomères et épimères ainsi que leurs sels d'addition à un acide ou à une base pharmaceutiquement acceptable. Médicaments.
Hautefaye Patrick
Laubie Michel
Lavielle Gilbert
Verbeuren Tony
Les Laboratoires Servier
Ogilvy Renault Llp/s.e.n.c.r.l.,s.r.l.
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