C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 477/00 (2006.01) A61K 31/40 (2006.01) A61K 31/695 (2006.01) C07D 477/20 (2006.01) C07F 7/10 (2006.01)
Patent
CA 2084018
ABSTRACT A compound of the formula: Image (I) wherein R1 is a hydrogen atom or a methyl group, R2 is a hydrogen atom or a negative charge, X is a group of -N(R3)R4 (wherein R3 is a lower alkyl group, and R4 is a hydrogen atom or a lower alkyl group) or a group of -N+(R5)(R6)R7 (wherein each of R5, R6 and R7 which may be the same or different, is a lower alkyl group), and n is an integer of from 2 to 4; or a pharmaceutically acceptable salt or ester thereof.
Fukatsu Hiroshi
Kato Shinji
Mitomo Ryuji
Murase Satoshi
Nakagawa Susumu
Banyu Pharmaceutical Co. Ltd.
Smart & Biggar
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