C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
C07C 245/08 (2006.01) B05D 1/20 (2006.01) C07C 255/27 (2006.01) C07D 487/22 (2006.01) C08G 73/00 (2006.01) C09B 43/11 (2006.01) C09B 47/20 (2006.01) C09K 9/02 (2006.01) G02F 1/29 (2006.01) G02F 1/361 (2006.01) G02F 3/00 (2006.01)
Patent
CA 2050717
ABSTRACT 35917 AMPHIPHILIC COMPOUNDS FOR SEQUENTIAL MONOLAYER DEPOSITION Amphiphilic compounds and oligomers and polymers derived therefrom suitable for Langmuir Blodgett deposition having the general formula Image where X is selected from -CNH-, -NHC-, Image , Image , Image , Image , Image , Image and Image where M is a molecular moiety. x and y may be the same or different and are between l and 6, preferably 2 or 3, B1 and B2 may be the same or different and are chosen from phenyl, alkylphenyl or any molecular moiety made hydrophobic by attachment of a group containing from 8 to 40, preferably 10 to 20, carbon atoms. P is selected from a C1 to C6 alkyl group, preferably methyl, Image , Image and -(CH2)X-Z-M Q is selected from a C1 to C6 alkyl group, 35917 14 preferably methyl, Image , (CH2)y-X-M and -(CH2)y-Z-M where Z is either Image or Image where B3 and B4 may be the same or different from B1 and B2 and are chosen from the same list of substituent groups with the proviso that when the compound contains only 2 nitrogen atoms in the chain both B1 and B2 must be molecular moieties made hydrophobic by attachment of a group containing 8 to 40 carbon atoms and when the compound contains only 3 nitrogen atoms at least one of B1, B2 r B3 or B4 must be a molecular moiety made hydrophobic by attachment of a group containing 8 to 40 carbon atoms. The compounds can be used to form non-centro symmetric bilayers and are useful for forming various non-linear optical elements.
Carter Neil
Devonald David Phillip
Hutchings Michael Gordon
Ryan Timothy George
Epigem Limited
Fetherstonhaugh & Co.
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