C - Chemistry – Metallurgy – 25 – D
Patent
C - Chemistry, Metallurgy
25
D
C25D 17/10 (2006.01) C23C 14/22 (2006.01) C23C 14/32 (2006.01) G02B 1/10 (2006.01) H01J 37/32 (2006.01)
Patent
CA 2325901
An electrode arrangement for the plasma-aided coating of a substrate (3) with a layer of material comprising at least one first and a second material component and for the production of a plasma discharge, more especially an arc discharge (35), having an anode arrangement (5), which provides the first material component at an anode material surface (13) for evaporation, and a cathode arrangement (7), which provides the second material component at a cathode material surface (25). The electrode arrangement is characterized in that the cathode material surface (25) is constituted by an evaporation-active part (27) supporting the plasma discharge (35) and an evaporation-inactive part (41) not supporting the plasma discharge. Preferably a motion producing means (49) is provided for moving the evaporation-inactive part (41) over the cathode material surface (25) in order to reduce deposit of material due to the first material component on the cathode material surface (25).
Bangert Stefan
Budke Elisabeth
Gebele Thomas
Grimm Helmut
Henrich Jurgen
Applied Films Gmbh & Co. Kg.
Balzers Und Leybold Deutshchland Holding Ag
Clark Wilson Llp
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