Antireflecttion-coated transparent substrate exhibiting...

C - Chemistry – Metallurgy – 03 – C

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C03C 17/34 (2006.01) B32B 17/10 (2006.01) E06B 3/67 (2006.01) G02B 1/11 (2006.01)

Patent

CA 2645314

Transparent especially glass, substrate (6) having at least on one of its sides an antireflection coating made from a stack (A) of thin dielectric layers of alternating high and low refractive indices, characterized in that the stack comprises, in succession: a high-index first film (1) having a refractive index n1 between 1.8 and 2.3 and a geometrical thickness e1 of between 10 and 25 nm; a low-index second film (2) with a refractive index n2 of between 1.40 and 1.55 and a geometrical thickness e2 of between 20 and 50 nm; a high-index third film (3) with a refractive index n3 of between 1.8 and 2.3 and a geometrical thickness n3 of between 110 and 150 nm; and a low-index fourth film (4) with a refractive index n4 of between 1.40 and 1.55 and a geometrical thickness e4 of between 60 and 95 nm, the algebraic sum of the geometrical thickness e3 + e1 being between 125 and 160 nm.

Substrat transparent (6), notamment verrier, comportant sur au moins une de ses faces un revêtement antireflet fait d'un empilement (A) de couches minces en matériau diélectrique d'indices de réfraction alternativement forts et faibles, caractérisé en ce que l'empilement comporte successivement : - une première couche (1 ) à haut indice, d'indice de réfraction ni compris entre 1 ,8 et 2,3 et d'épaisseur géométrique e1 comprise entre 10 et 25 nm, - une seconde couche (2) à bas indice, d'indice de réfraction n2 compris entre 1 ,40 et 1 ,55 et d'épaisseur géométrique e2 comprise entre 20 et 50 nm, - une troisième couche (3) à haut indice, d'indice de réfraction n3 compris entre 1 ,8 et 2,3 et d'épaisseur géométrique n3 comprise entre 110 et 150 nm, - une quatrième couche (4) à bas indice, d'indice de réfraction n4 compris entre 1 ,40 et 1 ,55 et d'épaisseur géométrique e4 comprise entre 60 et 95 nm, la somme algébrique des épaisseurs géométriques e3 + e1 étant comprise entre 125 et 160 nm.

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