C - Chemistry – Metallurgy – 08 – L
Patent
C - Chemistry, Metallurgy
08
L
18/1007, 317/3,
C08L 77/10 (2006.01) B32B 27/08 (2006.01) C08J 5/18 (2006.01) C08K 5/43 (2006.01)
Patent
CA 1316281
64536-648 ABSTRACT Disclosed is a film having antistatic characteristics and a method to make the film. The film comprises a blend of polyether block amide copolymer with an aromatic sulfonamide antistatic agent. More particularly, disclosed is an antistatic film comprising at least one layer comprising a blend of a polyether block amide copolymer having a degree of hydrophilicity suitable for packaging electronic devices in admixture with an aromatic sulfonamide antistatic agent, wherein said aromatic sulfonamide is substantially non-hygroscopic and substantially non-migratable.
566372
Smart & Biggar
W.r. Grace & Co.,-Conn.
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