C - Chemistry – Metallurgy – 08 – F
Patent
C - Chemistry, Metallurgy
08
F
C08F 6/10 (2006.01) B01D 3/22 (2006.01) B01D 3/38 (2006.01) B01J 8/12 (2006.01) C08F 6/00 (2006.01)
Patent
CA 2182068
Apparatus and method for removing residual monomers. When residual monomers contained in a PVC slurry are removed by bringing the slurry into contact with steam, optimal conditions of treatment can be flexibly selected with respect to a variety of PVCs with different properties. Moreover, the fluidity of the PVC slurry in the apparatus can be excellently maintained. Thus, PVCs with high quality can be stably manufactured. In addition, it is possible to control the operation to maintain high efficiency and high stability. The apparatus includes a hollow cylindrical tower 4; a plurality of plates 31 to 37 provided in a vertical direction in the tower 4, each having many perforations 43; a plurality of chambers 8, 25 to 31 each formed on one of the plates 31 to 37 which serves as a floor of the chamber; slurry introducing ports 19 to 24 provided in at least two of the chambers; flow-down sections 13 to 18 each provided between two adjacent plates to allow a slurry to sequentially flow down from a plate of a higher chamber to a plate of a lower chamber; a steam introducing port 10 provided at a bottom of the tower; a slurry discharging port 12 provided in a chamber lower than the chamber 29 having the slurry introducing port; and hot water jetting means 46 to 51 each provided directly under each of plates 31 to 36. The plate in one chamber (26) among the chambers which are provided with the slurry introducing port has a diameter 1.05 to 5 times as large as that of the plates in chambers 25 and 27.
Ishibashi Seigo
Kurazono Toshinobu
Matsuda Etsuro
Uchida Seiichi
Chisso Corporation
Macrae & Co.
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