Apparatus for coating a substrate

Details Apparatus for coating a substrate Apparatus for coating a substrate

C - Chemistry, Metallurgy

03

C

32/23, 117/81

C03C 17/00 (2006.01) C23C 16/455 (2006.01) C23C 16/54 (2006.01)

Patent

CA 1334910

A coating applicator is provided for depositing a film on a surface of glass (12) and other substrates by chemical vapor deposition. The applicator includes a pair of opposing coating nozzles (10a and 10b) for applying a vaporized coating chemical reactant in a carrier gas to the surface at such a concentration and velocity that coating of the surface is achieved under substantially reaction rate controlled conditions. Each coating nozzle (10a and 10b is positioned adjacent the surface (12) with a small clearance (C) therebetween which is open to the outside atmosphere. The opposing coating nozzles are directed toward each other at a selected angle with respect to a normal to the surface (12) of the substrate. The angle and the clearance provides a condition where there is substantially no intermixing of coating vapors with the outside atmosphere.

568829

Affiliated with

Also associated with

Rating

Apparatus for coating a substrate does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus for coating a substrate, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for coating a substrate will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFCA-PAI-O-1206507