Apparatus for introducing a process gas into a treatment...

Details Apparatus for introducing a process gas into a treatment... Apparatus for introducing a process gas into a treatment...

B - Operations, Transporting

01

J

165/52

B01J 10/00 (2006.01) B01F 5/00 (2006.01)

Patent

CA 1234749

APPARATUS FOR INTRODUCING A PROCESS GAS INTO A TREATMENT CHAMBER ABSTRACT OF THE DISCLOSURE A process gas is introduced into a treatment chamber (40) through a horizontal spiral gas supply duct (30)having a tangential inlet (31) and opening to a pair of concentric, inner and outer annular gas inlet ducts (12,22) surrounding a liquid spray apparatus (2). Partition means (32) divide the spiral supply duct (30) into independent inner and outer sub- ducts (34,36) which define separate inner and outer flow passages (44,46) connected respectively to the inner and outer annular gas inlet ducts (12,22). Damper means (70) is provided in the inlet to the outer sub-duct (36) to selectively control the flow of process gas (7) here through as a means of maintaining the velocity of the flow of process gas (5) through the inner flow passage (44) above a minimum acceptable velocity.

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