Aqueous developing solutions for reduced developer residue

Details Aqueous developing solutions for reduced developer residue Aqueous developing solutions for reduced developer residue

G - Physics

03

F

G03F 7/32 (2006.01)

Patent

CA 2270013

An alkaline aqueous developing solution for developing photoresists or the like contains, as an anti-scum agent, an ethoxylated surfactant having the general formula: R-[O-(AO)n]m-X (I) where AO are alkylene oxide units selected from ethylene oxide units (CH2-CH2- O) and propylene oxide units (CH(CH3)-CH2-O) or (CH2-CH(CH3)-O), where R is a hydrophobic group, X is H or an anionic group, m is from 1 to 3, and n is at least about 8, and the molar ratio of total ethylene oxide units to total propylene oxide units is between about 1:4 and about 4:1, preferably between about 2:3 and about 3:2.

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