C - Chemistry – Metallurgy – 23 – C
Patent
C - Chemistry, Metallurgy
23
C
C23C 4/00 (2006.01) C23C 16/513 (2006.01) C23C 16/517 (2006.01) H01J 37/32 (2006.01)
Patent
CA 2162529
An improved vacuum arc coating apparatus is provided, having a tube defining reaction zone with a plasma channel defined within a series of aligned annular substrate holders, or between an outer wall of an axial chain of substrate holder blocks and the inner wall of the tube. The substrate holders thus act as a liner, confining an arc within the plasma channel. Carrier and plasma-creating gases and the reaction species are introduced into the tube, and the deposition process may be carried out at a pressure between 10 Torr and 1000 Torr. Magnetic coils may be used to create a longitudinal magnetic field which focuses the plasma column created by the arc, and to create a transverse magnetic field which is used to bias the plasma column toward the substrates. Substrates can thus be placed anywhere within the reaction zone, and the transverse magnetic field can be used to direct the plasma column toward the substrate, or the tube itself can be rotated to pass the substrate through the plasma column. In multiple-arc embodiments a plurality of substrate holders defining a plurality of arc channels may be aligned coaxially or distributed transversely about the reaction zone.
Eisen Mark B.
G. & H. Technologies Llc
Gorokhovsky Vladimir I.
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