C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/602.8
C07D 303/22 (2006.01) C07C 45/28 (2006.01) C07C 45/64 (2006.01)
Patent
CA 1075264
ABSTRACT OF THE DISCLOSURE A compound of the formula: Image [I] wherein R is lower alykl, may be prepared, for example, by reducing a compound of the formula: Image or Image wherein R is same as above, Other methods for preparing the compound [I] are also disclosed. The compound [I] and a pharma- ceutically acceptable acid addition salt thereof are useful as anti-diabetic agents. - 1 -
267671
Hoshiyama Masao
Ikezaki Muneyoshi
Ito Nobuo
Nagao Taku
Nakajima Hiromichi
Na
Tanabe Seiyaku Co.
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