C - Chemistry – Metallurgy – 01 – B
Patent
C - Chemistry, Metallurgy
01
B
C01B 31/00 (2006.01) C04B 35/524 (2006.01) C23C 14/06 (2006.01) C23C 14/34 (2006.01)
Patent
CA 2143386
Abstract of the Disclosure Disclosed are a carbon target material for forming a carbon thin film, consisting essentially of a vitreous carbon produced from a polycarbodiimide resin; and a process for producing a carbon target material for forming a carbon thin film, which comprises molding into an appropriate shape a polycarbodiimide or a composition mainly comprising a polycarbodiimide and then carbonizing the resulting shaped material. The carbon target material for forming a carbon thin film is free from the problems of the prior art; causes no abnormal discharge and generates no powder leading to contamination, during sputtering; and has a high purity.
Ishimatsu Takeshi
Saito Kazuo
Nisshinbo Industries Inc.
Smart & Biggar
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