4. H - Electricity
  5. 01
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Takeshi Ishimatsu

H - Electricity – 01 – L

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Inventor

Country: Japan

Carbon target material for forming carbon thin film and...

C - Chemistry – Metallurgy – 01 – B
Patent

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Electrode for use in plasma etching

H - Electricity – 05 – H
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Electrode plate and jig for use in plasma etching

C - Chemistry – Metallurgy – 25 – D
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Instrument for production of semiconductor and process for...

H - Electricity – 01 – L
Patent

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Substrate for magnetic recording medium and process for...

G - Physics – 11 – B
Patent

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Profile ID: LFCA-PAI-P-1281694

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