Electrode plate and jig for use in plasma etching

Details Electrode plate and jig for use in plasma etching Electrode plate and jig for use in plasma etching

C - Chemistry, Metallurgy

25

D

C25D 17/10 (2006.01) C04B 35/52 (2006.01) C04B 35/524 (2006.01) H01J 37/32 (2006.01)

Patent

CA 2098162

Abstract of the Disclosure An electrode plate for use in plasma etching, which comprises a vitreous carbon material produced from a poly- carbodiimide resin as a raw material, or from a phenolic resin and a polycarbodiimide resin each as a raw material. The vitreous carbon material produced from a poly- carbodiimide resin or from a phenolic resin and a polycar- bodiimide resin, has no or substantially no pore and has a high strength. Therefore, it exhibits excellent properties when used in an electrode plate for plasma etching.

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