C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 501/24 (2006.01) A61K 31/545 (2006.01) A61K 31/695 (2006.01) C07D 501/00 (2006.01) C07F 7/10 (2006.01)
Patent
CA 2147609
New cephem compounds of formula (I), wherein R1 is amino or protected amino, R2 is hydrogen, a hydroxy protective group, lower alkyl or mono(or di or tri)halo(lower)alkyl, R3 is carboxy or protected carboxy, and R4 is pyridylvinyl which may have suitable substituent(s), with proviso that (i) when R2 is hydrogen and R4 is 3-pyridylvinyl, then R3 is not carboxy, and (ii) when R2 is tetrahydropyranyl and R4 is 3-pyridylvinyl, then R3 is not benzhydryloxycarbonyl, and pharmaceutical acceptable salts thereof which are useful as a medicament.
Kawabata Kohji
Nakamura Ayako
Nakamura Hideko
Sakane Kazuo
Shirai Fumiyuki
Fujisawa Pharmaceutical Co. Ltd.
Swabey Ogilvy Renault
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