C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
167/187, 260/104
C07D 519/00 (2006.01) A61K 31/545 (2006.01) C07D 471/08 (2006.01)
Patent
CA 1281318
ABSTRACT OF THE DISCLOSURE Described herein is a cephem derivative represented by the general formula: Image wherein Y stands for CH or a nitrogen atom and n stands for 1 or 2, R1 represents lower alkyl, lower alkenyl and lower alkynyl group which may be substituted by carboxy or carbanoyl groups, and R2 denotes hydroxyl group a hydroxy-substituted lower alkyl group, or carbamoyl group. The derivative is useful as antibacterial composition. Also described herein are process for the production of the derivative, antibacterial composition, intermediate of the derivative and process for the production thereof.
499268
Kamiya Takashi
Machida Yoshimasa
Negi Shigeto
Nomoto Seiichiro
Saito Isao
Eisai Co. Ltd.
Marks & Clerk
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