Chemical vapor deposition of films and resulting products

Details Chemical vapor deposition of films and resulting products Chemical vapor deposition of films and resulting products

B - Operations, Transporting

05

D

356/76, 117/85

B05D 5/12 (2006.01) C23C 16/22 (2006.01) C23C 16/34 (2006.01) H01L 21/318 (2006.01) H01L 29/51 (2006.01)

Patent

CA 1071941

CHEMICAL VAPOR DEPOSITION OF FILMS AND RESULTING PRODUCTS Abstract of the Disclosure Method for depositing a layer containing-Al, N, and Si on a substrate which comprises providing a substrate to be coated, a carrier gas, and a gaseous mixture of nitrogen source compounds, aluminum source compounds and silicon source material and heating the substrate to a temperature in the range of about 500 to about 1,300°C to thereby cause formation on the substrate of a layer con- taining Al, N, and Si: and products obtained by the method.

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