4. C - Chemistry, Metallurgy
  5. 09
  6. K

Stanley Zirinsky

C - Chemistry – Metallurgy – 09 – K

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Country: United States Of America

Chemical vapor deposition of films and resulting products

B - Operations – Transporting – 05 – D
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Method for providing a metal silicide layer on a substrate

H - Electricity – 01 – L
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Process for etching holes

C - Chemistry – Metallurgy – 09 – K
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Profile ID: LFCA-PAI-P-204860

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