C - Chemistry – Metallurgy – 11 – D
Patent
C - Chemistry, Metallurgy
11
D
C11D 3/43 (2006.01) B08B 3/08 (2006.01) B08B 3/10 (2006.01) C11D 3/16 (2006.01) C11D 7/50 (2006.01) C23G 1/24 (2006.01)
Patent
CA 2151848
A cleaning composition comprising at least one low molecular weight polyorganosiloxane selected from the group consisting of straight chain polydiorganosiloxane represented by a general formula: (see fig. I) (wherein R1 is an organic group of single valence substituted by the same or different group or unsubstituted, and 1 is an integer from 0 to 5), and cyclic polydiorganosiloxane represented by a general formula: (see fig. II) (wherein R1 is an organic group of single valence substituted by the same or different group or unsubstituted, and m is an integer from 3 to 7). To use it as a water system cleaning agent polyoxayalkylene group containing polyorganosiloxane, a surfactant, and water are additionally mixed. Accordingly, a cleaning effect free from environmental destruction and contamination, equivalent to freon* containing cleaning agents, and satisfactorily stable in terms of dispersion as a water system cleaning agent can be obtained. In addition, to use as a dewatering cleaning agent, the low molecular weight polyorganosiloxane is additionally mixed alone or with a surfactant and/or a hydrophilic solvent. Accordingly, cleaning and water substituting properties equivalent to freon* containing dewatering cleaning agents and environmental safety can be obtained. *Trademark
Imajo Yasutaka
Inada Minoru
Kabuki Kimiaki
Kurita Akitsugu
Oguni Takayuki
Kabushiki Kaisha Toshiba
Marks & Clerk
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