Continuous alignment target pattern and signal processing

Details Continuous alignment target pattern and signal processing Continuous alignment target pattern and signal processing

G - Physics

03

B

356/194

G03B 41/00 (2006.01) G03F 7/20 (2006.01) G03F 9/00 (2006.01)

Patent

CA 1211869

MI-3121 Abstract of the Disclosure The present invention is directed to an improvement in an alignment system for a scanning mask aligner employing a pattern on the mask or the wafer or both in the scribe lines that run in the direction of scanning, which includes a viewing system having optical grids, a system for moving the patterns across the optical grids in the viewing system, the grids corresponding to the directions and spacings of the pattern so that light transmitted through the grid is strongly modulated, and circuitry for comparing the phase modulation from the mask and wafer alignment targets to obtain alignment error signals, characterized by the improvement wherein the wafer pattern has a first edge type and a second edge type and circuitry is provided for separately detecting the first edge type and the second edge type.

448316

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