Deposition apparatus and methods

Details Deposition apparatus and methods Deposition apparatus and methods

C - Chemistry, Metallurgy

23

C

C23C 16/52 (2006.01) C23C 14/54 (2006.01) C23C 16/509 (2006.01) H01J 37/32 (2006.01)

Patent

CA 2124215

2124215 9311276 PCTABS00022 A reactor (10) defines a chamber (11) in which are disposed an upper electrode (12) and a lower workpiece electrode (13). The upper electrode is connected to a R.F. supply whilst the lower electrode is connected to a stress control unit (14). The stress control unit is used to adjust or maintain the effective resistance of the connection between the workpiece electrode (13) and ground.

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