Device fabrication entailing synchrotron radiation

G - Physics – 21 – K

Patent

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G21K 5/04 (2006.01) G03F 7/20 (2006.01) H01L 21/02 (2006.01) H01L 21/027 (2006.01)

Patent

CA 2121608

Devices built to design rules ~0.25µm are pattern delineated by use of synchrotron-emitted x-ray radiation using a condenser which collects over a collection arc of at lease 100 mrad. Condenser designs provide for processing of collected radiation to tailor characteristics such as direction and divergence. Pattern delineation by proximity printing as well as by projection printing is described. Forms of projection printing include reduction ringfield projection as by 5:1 mask:image reduction.

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