Device manufacture involving lithographic process

Details Device manufacture involving lithographic process Device manufacture involving lithographic process

H - Electricity

01

L

H01L 21/469 (2006.01) G03F 7/20 (2006.01) H01J 37/317 (2006.01) H01L 21/027 (2006.01)

Patent

CA 2094656

Fabrication of devices of Micron and submicron minimum feature size is accomplished by lithographic processing involving a back focal plane filter. A particularly important fabrication approach depends upon mask patterns which produce images based on discrimination as between scattered and unscattered radiation by accelerated electrons. Use of such masks is of value as applied to scanning systems providing for dynamic correction of aberrations by physical movement of or field shaping of the objective lens to maintain the optical axis coincident with the scanning information-containing beam.

La fabrication de dispositifs à caractéristiques dont les dimensions minimales sont de l'ordre du micromètre et du sous-micromètre se fait au moyen d'un processus lithographique utilisant un filtre à plan focal arrière. Il existe une méthode de fabrication particulièrement importante qui utilise des configurations de masquage qu produisent des images basées sur la discrimination entre le rayonnement diffusé et le rayonnement non diffusé par des électrons accélérés. L'utilisation de tels masques est très utile dans les systèmes de balayage car elle permet d'effectuer une correction dynamique des aberrations causées par les mouvements de l'objectif pour maintenir l'axe optique en coïncidence avec les faisceaux porteurs de l'information de balayage.

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