C - Chemistry – Metallurgy – 03 – C
Patent
C - Chemistry, Metallurgy
03
C
261/15, 31/153
C03C 8/04 (2006.01) C03C 8/08 (2006.01) H01B 1/08 (2006.01) H05K 1/09 (2006.01)
Patent
CA 1319714
DEVITRIFYING GLASS FRITS ABSTRACT OF THE DISCLOSURE A novel devitrifying frit is disclosed which has a coefficient of expansion essentially the same as that of silicon. The subject frits have a high softening temperature and excellent reheat stability which make them useful in ink formulations for forming dielectric layers in multilayer circuitry. The frits are also suitable for use as a substrate material for direct mounting of silicon chips or for use in thick film via-fill inks.
571414
Hang Kenneth Warren
Prabhu Ashok Narayan
Company General Electric
Craig Wilson And Company
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