C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 405/04 (2006.01) A61K 31/353 (2006.01) A61K 31/4709 (2006.01) A61K 31/517 (2006.01) A61P 35/00 (2006.01) C07D 407/04 (2006.01) C07D 407/12 (2006.01) C07D 409/04 (2006.01) C07D 409/12 (2006.01) C07D 471/04 (2006.01)
Patent
CA 2603637
Compounds of formula: (I) wherein A, B and D are respectively selected from the group consisting of: (i) CH, NH, C; (ii) CH, N, N; and (iii) CH, O, C; the dotted lines represent two double bonds in the appropriate locations; and where Z is selected from S, O, C(=O), CH2 and NH are disclosed for use in inhibiting DNA-PK.
Composés de formule: (I) dans laquelle A, B et D sont respectivement choisis parmi le groupe composé de: (i) CH, NH, C; (ii) CH, N, N; et (iii) CH, O, C; les lignes pointillées représentent deux doubles liaisons dans les emplacements appropriés; et Z est choisi parmi S, O, C(=O), CH2 et NH. Les composés sont décrits pour une utilisation dans l~inhibition de l~ADN-PK.
Calvert Hilary Alan
Cockcroft Xiao-Ling Fan
Curtin Nicola Jane
Desage-El Murr Marine
Frigerio Mark
Cancer Research Technology Limited
Kirby Eades Gale Baker
Kudos Pharmaceuticals Limited
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