C - Chemistry – Metallurgy – 07 – F
Patent
C - Chemistry, Metallurgy
07
F
C07F 13/00 (2006.01) A61K 51/00 (2006.01) A61K 51/04 (2006.01) C07C 69/753 (2006.01) C07D 451/02 (2006.01)
Patent
CA 2236578
Radiopharmaceutical compounds are disclosed. A tropane compound is linked through the N atom at the 8-position to a chelating ligand capable of complexing technetium or rhenium to produce a neutral labelled complex that selectively binds to the dopamine transporter. These compounds can be prepared as separate diastereoisomers as well as a mixture of diastereoisomers. Also disclosed are radiopharmaceutical kits for preparing the labelled radiopharmaceutical compounds. The compounds have the following structural formula: (see formula I) wherein R1 is selected from COOR a, COR a, CONHR a, CONR a R b, CH2CH3, (CH2)n CH3, CHCHR c, (CH2)n CCR c or an ester bioisostere; R2 is selected from C6H4X, C6H3X2, C10H6X, or C12H8WYCHO (diarylmethoxy); R a and R b are each selected from CH3, CH2CH3, CH2CH2CH3, (CH2)n CH3, CH(CH3)2, C(CH3)3, (CH2)n C6H5, C6H5. C6H4X, C10H7, or C10H6X; R c is selected from COOR a, CH3, (CH2)n CH3, C6H5, C6H4X, C10H7, or C10H6X; X is selected from H, Br, Cl, l, F, OH, OCH3, CF3, NO2, NH2, CN, OR, NHCOCH3, N(CH3)2, CH2CH3, CHOCH3, C(CH3)3; L is a linking moiety; and Ch is a chelating ligand.
L'invention concerne des composés radiopharmaceutiques. Un composé de tropane est lié, par l'intermédiaire de l'atome de N se trouvant à la position 8, à un ligand chélatant pouvant complexer le technétium ou le rhénium pour produire un complexe neutre marqué qui se fixe, de façon sélective, au transporteur de la dopamine. Ces composés peuvent être préparés sous la forme de diastéréoisomères séparés ou sous la forme d'un mélange de diastéréoisomères. L'invention concerne également des kits radiopharmaceutiques utilisés pour préparer les composés radiopharmaceutiques marqués.
Blundell Paul
Davison Alan
Jones Alun G.
Madras Bertha K.
Mahmood Ashfaq
Dimock Stratton Llp
Massachusetts Institute Of Technology
Organix Inc.
President And Fellows Of Harvard College
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