Dry film resist and production of resist images

Details Dry film resist and production of resist images Dry film resist and production of resist images

G - Physics

03

F

96/150

G03F 7/027 (2006.01)

Patent

CA 1259218

- 42 - Abstract of the Disclosure: In dry film resists possessing a solid photopolymerizable resist layer, which is applied on a temporary base and can be developed with aqueous, in particular aqueous alkaline, media, and, if required, a cover sheet on the resist layer, the said resist layer is built from a homogeneous mixture of a) not less than 40% by weight of one or more oligomers which contain free carboxyl groups and more than two acryloyl and/or meth- acryloyl groups and are soluble or dispersible in aqueous alkaline solutions, b) from 1 to 35% by weight of one or more film-forming compatible polymers which are soluble in aqueous media, c) from 1 to 30% by weight of one or more compatible photopolymerizable monomers, d) from 0.001 to 10% by weight of one or more photoinitiators and e) from 0 to 30% by weight of further additives and/or assistants. Resist images are produced on a substrate by a process employing photopolymerizable resist layers of the type stated above.

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