Electrostatic chuck

Details Electrostatic chuck Electrostatic chuck

H - Electricity

01

L

356/195

H01L 21/00 (2006.01) H01L 21/683 (2006.01)

Patent

CA 1313428

ABSTRACT OF THE DISCLOSURE An electrostatic chuck for electrostatically attracting and holding an object such as a semiconductor wafer includes a base plate, at least two layers each including an electrically insulating film and an electrode attached to a lower surface thereof, the at least two layers being disposed as attractive layers on the base plate, and a voltage applying assembly for selectively applying a voltage to at least one of the electrodes to electrostatically attract the object to the insulating film of an uppermost one of the layers. The insulating films may have different insulation resistances to allow for a wider range of temper- ature changes.

611988

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