End-hall ion source

H - Electricity – 01 – J

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

358/25

H01J 27/02 (2006.01) H01J 37/08 (2006.01) H05H 1/24 (2006.01)

Patent

CA 1268864

ABSTRACT OF THE DISCLOSURE A gas, ionizable to produce a plasma, is introduced into a region defined within an ion source. An anode is disposed near one end of that region, and a cathode is located near the other. A potential is impressed between the anode and the cathode to produce electrons which flow generally in a direction from the cathode toward the anode and bombard the gas to create a plasma. A magnetic field is established within the region in a manner such that the field strength decreases in the direction from the anode to the cathode. The direction of the field is generally between the anode and the cathode. The electrons are produced independently of any ion bombardment of the cathode, the magnet is located outside the region on the other side of the anode and the gas is introduced uniformly across the region.

538056

LandOfFree

Say what you really think

Search LandOfFree.com for Canadian inventors and patents. Rate them and share your experience with other people.

Rating

End-hall ion source does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with End-hall ion source, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and End-hall ion source will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFCA-PAI-O-1207881

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.