4. H - Electricity
  5. 01
  6. J

Harold R. Kaufman

H - Electricity – 01 – J

Inventor

Rate now
  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

Inventor

Country: United States Of America

Apparatus for sputter deposition

C - Chemistry – Metallurgy – 23 – C
Patent

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Capacitively coupled radiofrequency plasma source

H - Electricity – 05 – H
Patent

  [ 0.00 ] – not rated yet Voters 0   Comments 0

End-hall ion source

H - Electricity – 01 – J
Patent

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Industrial hollow cathode

H - Electricity – 01 – J
Patent

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Ion source

H - Electricity – 01 – J
Patent

  [ 0.00 ] – not rated yet Voters 0   Comments 0

End-hall ion source

H - Electricity – 01 – J
Patent

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Ion source

H - Electricity – 01 – J
Patent

  [ 0.00 ] – not rated yet Voters 0   Comments 0

LandOfFree

Say what you really think

Search LandOfFree.com for Canadian inventors and patents. Rate them and share your experience with other people.

Rating

Harold R. Kaufman does not yet have a rating. At this time, there are no reviews or comments for this inventor.

If you have personal experience with Harold R. Kaufman, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Harold R. Kaufman will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFCA-PAI-P-1127844

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.

Canada

 Charities
 Companies
 MP Candidates
 Patents
 Employee Salary Disclosure

World

 Places of the World
 Scientific Papers

United States

 Banks
 Companies
 Counties
 Patents
 Employee Salary Disclosure