End point detection method

Details End point detection method End point detection method

H - Electricity

05

K

356/188, 356/2

H05K 3/00 (2006.01) G01B 11/06 (2006.01) G03F 7/30 (2006.01)

Patent

CA 1187202

- 10 - END POINT DETECTION METHOD Abstract The clearing point of photoresist development is detected automatically by illuminating the developing photoresist surface with intense monochromatic light. Interfering reflection from the resist-substrate interface and the fast eroding and slow eroding resist surfaces produces fast and slow oscillatory signals. These signals are processed to produce a logical output indicative of the cessation of the fast oscillations in the presence of the continuing slow oscillations signaling the clearing point of development.

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