C - Chemistry – Metallurgy – 03 – C
Patent
C - Chemistry, Metallurgy
03
C
96/256
C03C 15/00 (2006.01) C03C 17/23 (2006.01) C03C 21/00 (2006.01) G03F 7/00 (2006.01) G11B 7/253 (2006.01) G11B 7/26 (2006.01)
Patent
CA 1329507
ABSTRACT ETCHED GLASS AND PROCESS OF MANUFACTURING SAME The invention relates to an article comprising a glass sheet and having an etched pattern, and to a process of manufacturing an article comprising a glass sheet and having an etched pattern. The glass sheet 11 is a chemically tempered glass sheet, and the pattern comprises one or more grooves 10 etched into the article using fluorine ions to a depth of less than 2µm. The etched grooves 10 constituting the pattern may be formed in a layer 12 of inorganic material such as SiO2. They may have a width of less than 10µm and the spacing (p) between two adjacent grooves may also be less than 10µm. The etching may be performed by applying a layer of radiation-sensitive material to at least one face of that sheet and exposing it to radiation to form a latent image of a desired groove pattern, whereafter the radiation- sensitive material is developed to form a resist and the sheet is exposed, through the resist, to the action of fluorine ions in an etching medium to etch the desired groove pattern to a depth of less than 2µm. The invention is particularly useful for forming storage discs for recording data and also for forming panels of high optical transmittance. (Figure 3).
554161
Hecq Andre
Ledroit Rene
Glaverbel
Swabey Ogilvy Renault
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