Fabrication of microstructures and nanostructures using...

Details Fabrication of microstructures and nanostructures using... Fabrication of microstructures and nanostructures using...

G - Physics

03

F

G03F 7/00 (2006.01) B82B 3/00 (2006.01)

Patent

CA 2671289

Nanostructures and microstructures are formed by patterning methods such as Dip Pen Nanolithography (DPN) or microcontact printing of organic molecules functioning as a resist on a substrate followed by an etching step. The etch resist is a patterning composition and can contain on a substrate including polyethylene glycol (PEG). Positive and negative etch methods can be used.

La présente invention concerne des nanostructures et des microstructures qui sont formées par des procédés de modelage tels que la nanolithographie stylo à plume (DPN) ou l'impression par microcontact de molécules organiques fonctionnant en tant que réserve sur un substrat suivi d'une étape de gravure. La réserve de gravure est une composition de modelage et peut être contenue sur un substrat comportant du glycol de polyéthylène (PEG). Des procédés de gravure positive et négative peuvent être utilisés.

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