C - Chemistry – Metallurgy – 03 – B
Patent
C - Chemistry, Metallurgy
03
B
C03B 19/14 (2006.01) C03B 19/10 (2006.01) C03C 12/00 (2006.01) C03C 14/00 (2006.01)
Patent
CA 2378479
The oxides-enclosed fine glass particles are arranged such that two or more pieces of at least two kinds of enclosing particles, which comprise oxides, double oxides, or salts of oxyacids, or double oxides or double salts thereof, are enclosed in each of the fine glass particles. The fine particles can be easily manufactured by mixing a powder material of glass with a powder material of oxides which comprise oxides, double oxides, or salts of oxyacids, or double oxides or double salts thereof that are not made to glass; converting the thus obtained mixture of the materials into a mixture in a vapor-state by supplying the thermal plasma thereto; and quickly cooling the mixture in the vapor-state. Highly-scattered fine particles of oxides can be easily obtained from the fine particles, and thus a plurality of kinds of fine particles of oxides can be evenly and uniformly mixed in a small amount with a mother material without being unevenly scattered.
L'invention concerne de fines particules de verre qui contiennent dans chaque cas, enrobées dedans, au moins deux fines particules d'au moins deux éléments sélectionnés parmi des oxydes, des oxydes doubles, des sels d'oxoacides, ainsi que des oxydes doubles et des sels doubles desdits oxydes doubles. Ces fines particules peuvent être obtenues aisément par mélange de poudre de verre brute avec de la poudre d'oxyde brute comprenant un oxyde non vitrifié, un oxyde double, un sel d'oxoacide ou un oxyde double ou un sel dudit oxyde double. Le mélange brut qui en résulte est placé dans un plasma chaud afin d'y être converti en mélange gazeux, ledit mélange gazeux étant ensuite refroidi rapidement. Ce système permet d'obtenir aisément de fines particules d'oxyde hautement dispersées. Une faible quantité d'au moins deux sortes de fines particules d'oxyde peut être mélangée de manière uniforme à une matière de base sans être répartie de manière irrégulière.
Fujii Takashi
Nishimura Keiichi
Shinozaki Sadao
Yubuta Kazuhiro
Kirby Eades Gale Baker
Nisshin Seifun Group Inc.
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