C - Chemistry – Metallurgy – 02 – F
Patent
C - Chemistry, Metallurgy
02
F
C02F 1/32 (2006.01) B01J 19/12 (2006.01) B08B 1/00 (2006.01) B08B 9/02 (2006.01)
Patent
CA 2338879
A cleaning apparatus (10) for a radiation source assembly (35) in a fluid treatment system is described. The cleaning apparatus comprises cleaning chamber (20) and a second chamber (25,30) independent of the cleaning chamber which defines a fluid (typically water) buffer layer to obviate or mitigate cleaning fluid from the cleaning chamber leaking into the fluid being treated. The fluid treatment system is particularly useful for us in clean water applications in which ultraviolet radiation is used to treat the water while having the advantages of in situ cleaning of the radiation source when it becomes fouled.
La présente invention concerne un appareil de nettoyage (10), destiné à un assemblage de source de rayonnement (35), dans un système de traitement de fluide. L'appareil de nettoyage comprend une enceinte de nettoyage (20) et une seconde enceinte (25,30), indépendante de l'enceinte de nettoyage, qui définit une couche tampon de fluide (typiquement de l'eau) permettant d'éviter ou d'atténuer une fuite de liquide de nettoyage dans le fluide en traitement. Le système de traitement de fluide est particulièrement utile dans des applications d'eau propre dans lesquelles un rayonnement ultraviolet est utilisé afin de traiter l'eau tout en présentant les avantages de nettoyage <u>in situ</u> de la source de rayonnement lorsqu'elle devient encrassée.
Dall'armi Vivian
Fang Gang
Lawryshyn Yuri
Lem Joseph
Penhale Douglas
Gowling Lafleur Henderson Llp
Trojan Technologies Inc.
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