Fluoropolymer protectant layer for high temperature...

G - Physics – 03 – F

Patent

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G03F 7/00 (2006.01) C08F 214/18 (2006.01) H01L 21/47 (2006.01) H01L 39/12 (2006.01) H01L 39/24 (2006.01) H01P 7/10 (2006.01) H05K 1/03 (2006.01) H05K 3/00 (2006.01)

Patent

CA 2188770

Processes for pattering amorphous fluoropolymer TeflonAF, passivating high temperature superconductor films, and improved electronic devices with amorphous fluoropolymer TeflonAF films are disclosed.

La présente invention concerne, d'une part un procédé de dépôt du fluoropolymère amorphe Téflon3 AF suivant un tracé, et un procédé de passivation de couches minces supraconductrices à haute température, et d'autre part des dispositifs électroniques améliorés présentant des couches minces de fluoropolymère amorphe Téflon3 AF.

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