G - Physics – 03 – F
Patent
G - Physics
03
F
G03F 7/20 (2006.01) G03F 7/26 (2006.01)
Patent
CA 2385675
In the formation of microstructures, a preformed sheet of photoresist, such as polymethylmethacrylate (PMMA), which is strain free, may be milled down before or after adherence to a substrate to a desired thickness. The photoresist is patterned by exposure through a mask to radiation, such as X-rays, and developed using a developer to remove the photoresist material which has been rendered susceptible to the developer. Micrometal structures may be formed by electroplating metal into the areas from which the photoresist has been removed. The photoresist itself may form useful microstructures, and can be removed from the substrate by utilizing a release layer between the substrate and the preformed sheet which can be removed by a remover which does not affect the photoresist. Multiple layers of patterned photoresist can be built up to allow complex three dimensional microstructures to be formed.
Christenson Todd R.
Guckel Henry
Skrobis Kenneth J.
Borden Ladner Gervais Llp
Wisconsin Alumni Research Foundation
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